Description

This company's AIMS (Aerial Imaging Measurement System) has served as the industry-standard platform for over 30 years for qualifying photomask defects by simulating how they will actually print during lithography. It lets mask shops evaluate whether a detected defect on a DUV or EUV photomask will actually impact wafer patterning, distinguishing printable defects that require repair from harmless ones.

Specifications

Category

Other Industrial Products

Location

Carl-Zeiss-Straße 22 73447 Oberkochen Germany

Listed

3 weeks ago

Views

13