Description

This is a 13.56MHz RF power generator used to supply the radio-frequency energy needed to strike and sustain plasma inside a semiconductor process chamber, originally used as an OEM component on Novellus deposition and etch tool platforms. It converts AC line power into a precisely controlled RF output at a set power level, which is delivered to the process chamber, typically through a matching network, to drive plasma-based deposition or etch processes.

Specifications

Manufacturer

Advanced Energy

Model

3155038

Category

Electrical & Power

Condition

New

Location

United States

Listed

1 month ago

Views

18