Description

Focused Beam Laser Ellipsometry System Condition: Used Year: 2010 Serial Number: 405SSA1624AM13 Wafer Size: 12 Inch (300 mm) Shipping Terms: EXW Specifications Process: Focused Beam Laser Ellipsometry Wafer Capacity: 300 mm Equipment Type: Laser Ellipsometry / Thin Film Metrology System Category: Semiconductor Metrology / Inspection Subcategory: Metrology Description This 2010 semiconductor metrology system utilizes Focused Beam Laser Ellipsometry technology for non-contact optical measurement and characterization of thin films. The system supports 12-inch (300 mm) wafers and is suitable for semiconductor process monitoring, thin-film characterization, research and development, and production metrology applications. The equipment is offered in used condition with EXW shipping terms.