Description

System Configuration Lens: Tropel 2955 4:1 I-Line (365 nm), 0.55 NA, 28.8 mm Field Size AWHIIIB – Automatic Wafer Handler: Configured to cycle 25 × 6-inch wafers. The AWH can be configured for 3-inch to 8-inch wafers. 1-inch, 2-inch, or individual chips can also be loaded manually. Theta/Z Stage: Provides wafer rotation, level adjustment, and Z-axis motion. RMS10 – Reticle Management System: Supports loading and storage of up to ten 5-inch reticles. Illuminator: I-Line light source operating at 700 W idle power and capable of pulsing up to 1000 W during wafer exposure. CFS – Automatic Focusing System: Provides automatic focusing during operation. MicroDFAS: Local alignment system that measures and corrects stage alignment prior to stepping. PPC/RRS: Provides reticle rotation and Z-axis motion using piezo actuators. Insitu: Stage-mounted probe used to measure and correct lens reduction, rotation, and focus. It also measures and corrects system alignment baselines. IQ Probe: Used to optimize lamp position and light-source uniformity. It also accurately measures and corrects exposure dose. Computer: Sun Workstation, SPARCstation 5. GWA – Global Wafer Alignment: Performs automatic digital alignment of global wafer targets. ACS – Atmospheric Compensation System: Uses nitrogen to pressurize the reduction lens and accurately measure and compensate for environmental changes. Chamber: XLS environmental chamber protects the stepper while maintaining controlled temperature and cleanliness.

Specifications

Manufacturer

China 4Fabs Technologies Co., Ltd.,

Category

Semiconductor & Electronics

Condition

USED

Location

🇨🇳 Wuxi, Jiangsu, China

Listed

1 month ago

Views

14